Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization

• Main Authors: Naiyuan Sheng, Enze Li, Yiyu Sun, Tie Li, Yanqiu Li, Pengzhi Wei, Lihui Liu
• Format: Article
• Language: English
• Published: MDPI AG 2019-03-01
• Series: Applied Sciences
• Subjects: computational lithography; mask absorber; co-optimization; process window (PW)
• Online Access: https://www.mdpi.com/2076-3417/9/7/1275

The non-ideal mask absorber can cause an increase in critical dimension error (CDE) and decrease in process window (PW). However, the random mask absorber errors induced during mask fabricating and measuring are not considered in computational lithography. The problem cannot be neglected as the continuous scaling of lithography technology node. In this work, for the first time to our knowledge, a source, numerical aperture (NA), and process parameters co-optimization (SNPCO) method is developed to reduce the CDE induced by absorber errors and improve the PW. First, the source is represented by Zernike polynomials to balance computational burden and flexibility of source. Then a weighted cost function containing CDE and PW that incorporates the influences of absorber errors is created. Finally, a statistical optimization method is used to optimize the lithographic system parameters. Simulations of 1D mask pattern show that for the system with extreme absorber errors, the pattern errors of the proposed method are reduced by 62.1% and 58.9%, and the PWs are increased by 40.3% and 36.4%, respectively. The results illustrate that this method is effective in mitigating the CDE caused absorber errors and improving process robustness.