Radiation hardness of silicon doped by germanium with high concentration of free oxygen

Radiation hardness of Czochralski grown n-type silicon samples, doped by germanium (NGe = 2 ⋅ 1020 cm-3) and without that was investigated after irradiaton by fast neutrons of WWR-M reactor at room temperature.The dependence of effective carrier concentration on fluence was described in the framew...

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Bibliographic Details
Main Authors: M. D. Varentsov, G. P. Gaidar, A. P. Dolgolenko, P. G. Litovchenko
Format: Article
Language:English
Published: Institute for Nuclear Research, National Academy of Sciences of Ukraine 2006-06-01
Series:Âderna Fìzika ta Energetika
Online Access:http://jnpae.kinr.kiev.ua/17(1)/Articles_PDF/jnpae-2006-1(17)-0060-Varentsov.pdf