Self-Assembled Monolayers on Highly Porous Low-<i>k</i> Dielectrics by 3-Aminopropyltrimethoxysilane Treatment
Highly porous low-dielectric-constant (low-<i>k)</i> dielectric materials with a dielectric constant (<i>k</i>) less than 2.50 are needed for 32 nm and beyond technological nodes. In this study, a highly porous low-<i>k</i> dielectric film with a <i>k</i&...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2019-04-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/9/4/246 |