Unified Mechanism for Positive- and Negative-Bias Temperature Instability in GaN MOSFETs

We present a comprehensive study of bias temperature instability (BTI) in GaN MOSFETs under moderate positive and negative gate bias stress. We investigate the evolution of threshold voltage (V T ), maximum transconductance (g m,max ), and subthreshold swing (S). Our results show a universal continu...

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Bibliographic Details
Main Authors: Guo, Alex (Author), del Alamo, Jesus A. (Author)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor)
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineers (IEEE), 2020-07-14T02:20:43Z.
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