PAG segregation during exposure affecting innate material roughness

PAG segregation during exposure affecting innate material roughness

We have developed an improved AFM-based technique to measure intrinsic material roughness (IMR) after base development. We have investigated the contribution of different polymeric PAGs to IMR. These polymeric PAGs include copolymers of several styrenic PAGs with hydroxystyrene. The IMR of these pol...

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Bibliographic Details
Main Authors: Pottebaum, Indira (Contributor), Cann, Susan G. (Contributor), Cabral, Alberto (Contributor), Astolfi, David K. (Contributor), Fedynyshyn, Theodore H. (Contributor), Roberts, Jeanette M. (Author)
Other Authors: Lincoln Laboratory (Contributor)
Format: Article
Language:English
Published: The International Society for Optical Engineering, 2010-03-17T16:26:20Z.
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