50-nm E-mode In[subscript 0.7]Ga[subscript 0.3]As PHEMTs on 100-mm InP substrate with f[subscript max] > 1 THz

We have demonstrated 50-nm enhancement-mode (E-mode) In[subscript 0.7]Ga[subscript 0.3]As PHEMTs with f[subscript max] in excess of 1 THz. The devices feature a Pt gate sinking process to effectively thin down the In[subscript 0.52]Al[subscript 0.48]As barrier layer, together with a two-step recess...

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Bibliographic Details
Main Authors: del Alamo, Jesus A. (Contributor), Kim, Dae-Hyun (Author), Chen, Peter (Author), Ha, Wonill (Author), Urteaga, Miguel (Author), Brar, B. (Author)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor)
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineers (IEEE), 2012-09-24T18:12:24Z.
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