Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar to, but of potentially higher resolution than, scanning electron-beam lithography. This article describes the control of this microscope for lithography via beam steering/b...

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Bibliographic Details
Main Authors: Winston, Donald (Contributor), Cord, Bryan M. (Contributor), Ming, B. (Author), Bell, David C. (Author), DiNatale, W. F. (Author), Stern, L. A. (Author), Vladar, A. E. (Author), Postek, M. T. (Author), Mondol, Mark K. (Contributor), Yang, Joel K. W. (Contributor), Berggren, Karl K. (Contributor)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Research Laboratory of Electronics (Contributor)
Format: Article
Language:English
Published: American Vacuum Society (AVS), 2012-10-18T19:19:48Z.
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