Modeling Study on GaN Etch Process Using High Density Chlorine Plasmas
碩士 === 中原大學 === 化學工程研究所 === 90 === Cl2/Ar plasmas are widely used in the dry etching of semiconductors. However, current modeling studies still focus on plasma processing of silicon-based materials. Very few modeling studies on compound semiconductors exist. In order to investigate the plasma etchin...
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68809674766374789475 |