Effects of Device Dimension on Characteristics and Reliability of N-LDMOS Transistors

碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 101 === The main purpose of this thesis is to investigate the device characteristics and hot carrier reliability of P-buried N-type LDMOS with different device dimension. The device used in this thesis has four main layout parameters b, a, c, and R, which correspon...

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Bibliographic Details
Main Authors: Ya-ShengFeng, 馮雅聖
Other Authors: Jone-Fang Chen
Format: Others
Language:en_US
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/23092320087905306776