Hydrophobic and Oleophobic Fluorocarbon Films Prepared Using C4F8 and C3F8 Precursors
碩士 === 國立虎尾科技大學 === 材料科學與綠色能源工程研究所 === 101 === Fluorinated carbon films were deposited by plasma assisted chemical vapor deposition using C2H2, C4F8, C3F8, hexamdethyldisiloxane (HMDSO), Ar and O2 gases, and the oleophobic and hydrophobic properties were evaluated. The surface characteristics of the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/78zepb |