Benchmarking Post-Placement Dual Supply Voltages Methodology for Structured ASICs

碩士 === 元智大學 === 資訊工程學系 === 101 === With the evolution of the semiconductor industry, integrated circuit manufacturing process advances to a situation that requires expensive lithographic equipment. Nowadays, the mask cost of advanced technology is up to several millions. In order to reduce design co...

Full description

Bibliographic Details
Main Authors: Chang-Hao Chiu, 邱昶豪
Other Authors: Rung-Bin Lin
Format: Others
Language:en_US
Online Access:http://ndltd.ncl.edu.tw/handle/46443207246554092900