CLM Effect for 28nm Stacked HK nMOSFETs after DPN Treatment with Annealing Temperatures
碩士 === 明新科技大學 === 電子工程研究所 === 102 === Due to the evolution of the advanced process technology entering the nano-scale era, in accordance with the principles of Moore's law, in order to enhance metal-oxide-semiconductor field-effect transistor (MOSFET) performance, therefore, narrowing MOSFETs d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/98178453692740145434 |