A novel lithographic hotspot detection framework
博士 === 國立交通大學 === 電子工程學系 電子研究所 === 103 === In advanced process technology, the ever-growing sub-wavelength lithography gap causes unwanted shape distortions of the printed layout patterns. Although design rule checking (DRC) and reticle/resolution enhancement techniques (RET), such as optical proxim...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/06192899195124509523 |