large-scale data analysis of in-situ Plasma optical emission spectroscopy for PECVD hydrogenated nano-crystalline silicon (nc-Si:H) films
碩士 === 國立中央大學 === 光機電工程研究所 === 106 === large-scale data analysis of Plasma Enhanced Chemical Vapor Deposition (PECVD) hydrogenated nanocrystalline germanium (nc-Si:H) thin films was investigated by plasma spectroscopy (OES) plasma diagnostics. The effect of hydrogen dilution ratio(R = H_2 / 〖SiH〗_4)...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/dwyz3y |