Conformal deposition of WS2 layered film by low-temperature metal-organic chemical vapor deposition
Large area multi-layer WS2 film has high potential as a channel material for MOSFETs in next-generation LSIs. State-of-the-art LSIs have complex three-dimensional (3D) structures such as vertical channels and multi-layer stacked channels surrounded by gate electrodes. To develop such structures, it...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Institute of Physics
2023
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| Subjects: | |
| Online Access: | View Fulltext in Publisher |